US Patent 9384992 Plasma processing method
Patent 9384992 was granted and assigned to Tokyo Electron on July, 2016 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
February 1, 2013
Date of Patent
July 5, 2016
Patent Applicant
Patent Application Number
14373658
Patent Citations Received
•••
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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