US Patent 9396960 Plasma processing method and plasma processing apparatus
Patent 9396960 was granted and assigned to Tokyo Electron on July, 2016 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
October 31, 2013
Date of Patent
July 19, 2016
Patent Applicant
Patent Application Number
14432541
Patent Citations Received
•••
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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