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US Patent 9457520 Apparatus for printing a chemical mechanical polishing pad

Patent 9457520 was granted and assigned to Applied Materials on October, 2016 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 12023853 Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
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US Patent 12011801 Printing a chemical mechanical polishing pad
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US Patent 11986922 Techniques for combining CMP process tracking data with 3D printed CMP consumables
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US Patent 11980992 Integrated abrasive polishing pads and manufacturing methods
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US Patent 11964359 Apparatus and method of forming a polishing article that has a desired zeta potential
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Patent abstract

A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.

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Patent Inventor Names
Barry Lee Chin0
Rajeev Bajaj0
Terrance Y. Lee0
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Patent Citations Received
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US Patent 11685014 Formulations for advanced polishing pads
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US Patent 11679531 Chemical mechanical polishing pad and preparation thereof
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Patent Citations Received
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US Patent 11673225 Printing a chemical mechanical polishing pad
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=094575200
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US Patent 09457520 Apparatus for printing a chemical mechanical polishing pad US Patent 9457520 Apparatus for printing a chemical mechanical polishing pad

Infobox
Patent Number
094575200
Patent Number
94575200
Edits on 25 Sep, 2022
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edited on 25 Sep, 2022
Infobox
Is a
Patent
Patent
0
Patent Applicant
Applied Materials
Applied Materials
0
Current Assignee
Applied Materials
Applied Materials
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
094575200
Date of Patent
October 4, 2016
0
Patent Application Number
147373560
Date Filed
June 11, 2015
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=094575200
Patent Primary Examiner
‌
Mary F Theisen
0
Edits on 6 Jun, 2022
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edited on 6 Jun, 2022
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Infobox (+1 properties)
Infobox
Website URL
https://pdfpiw.uspto.gov/.piw?Docid=09457520
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created this topic on 8 Jan, 2022
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Infobox (+9 properties)
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 US Patent 09457520 Apparatus for printing a chemical mechanical polishing pad

Infobox
Is a
Patent
Patent
Patent applicant
Applied Materials
Applied Materials
Current assignee
Applied Materials
Applied Materials
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
09457520
Date of patent
October 4, 2016
Patent application number
14737356
Date Filed
June 11, 2015
Patent primary examiner
‌
Mary F Theisen

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