Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shiyu Sun0
Theresa Kramer Guarini0
Benjamin Colombeau0
Michael Chudzik0
Naomi Yoshida0
Sung Won Jun0
Date of Patent
October 4, 2016
0Patent Application Number
147550990
Date Filed
June 30, 2015
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Embodiments described herein generally relate to methods and apparatus for horizontal gate all around (hGAA) isolation. A superlattice structure comprising different materials arranged in an alternatingly stacked formation may be formed on a substrate. The different materials may be silicon containing materials and one or more III/V materials. In one embodiment, at least one of the layers of the superlattice structure may be oxidized to form a buried oxide layer adjacent the substrate.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
