Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
October 11, 2016
Patent Application Number
14674127
Date Filed
March 31, 2015
Patent Citations Received
Patent Primary Examiner
Patent abstract
Some embodiments include a method of fabricating features associated with a semiconductor substrate. A first region of the semiconductor substrate is altered relative to a second region. The altered first region has different physisorption characteristics for polynucleotide relative to the second region. The altered first region and the second region are exposed to polynucleotide. The polynucleotide selectively adheres to either the altered first region or the second region to form a polynucleotide mask. The polynucleotide mask is used during fabrication of features associated with the semiconductor substrate.
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