Patent 9484423 was granted and assigned to SAMSUNG ELECTRONICS CO., LTD. on November, 2016 by the United States Patent and Trademark Office.
A field effect transistor includes a body layer comprising a crystalline semiconductor channel region therein, and a gate stack on the channel region. The gate stack includes a crystalline semiconductor gate layer, and a crystalline semiconductor gate dielectric layer between the gate layer and the channel region. Related devices and fabrication methods are also discussed.