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US Patent 9507907 Computational wafer inspection
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Patent
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Date Filed
June 4, 2015
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Date of Patent
November 29, 2016
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Patent Application Number
14730993
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Patent Citations Received
US Patent 11996267 Particle beam apparatus, defect repair method, lithographic exposure process and lithographic system
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US Patent 12092965 Process variability aware adaptive inspection and metrology
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US Patent 12067340 Computational wafer inspection
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Patent Inventor Names
Bernardo Kastrup
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Arie Jeffrey Den Boef
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Christophe David Fouquet
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James Benedict Kavanagh
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James Patrick Koonmen
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Johannes Catharinus Hubertus Mulkens
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Neal Patrick Callan
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
9507907
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Patent Primary Examiner
Sun Lin
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