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US Patent 9536749 Ion energy control by RF pulse shape

Patent 9536749 was granted and assigned to Lam Research on January, 2017 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Lam Research
Lam Research
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Date Filed
December 15, 2014
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Date of Patent
January 3, 2017
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Patent Applicant
Lam Research
Lam Research
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Patent Application Number
14570859
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Patent Citations Received
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US Patent 11842884 Spatial monitoring and control of plasma processing environments
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US Patent 11942309 Bias supply with resonant switching
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US Patent 11887812 Bias supply with a single controlled switch
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US Patent 11978613 Transition control in a bias supply
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US Patent 11996276 Ion collector for use in plasma systems
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US Patent 12125674 Surface charge and power feedback and control using a switch mode bias system
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US Patent 12068131 Multi-level parameter and frequency pulsing with a low angular spread
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US Patent 11670487 Bias supply control and data processing
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Patent Inventor Names
Alexei Marakhtanov
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John Patrick Holland
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Zhigang Chen
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9536749
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Patent Primary Examiner
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Jiong-Ping Lu
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