Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 24, 2017
Patent Application Number
14864122
Date Filed
September 24, 2015
Patent Citations Received
Patent Primary Examiner
Patent abstract
A method for fabricating a semiconductor device comprises forming active regions on a semiconductor substrate, forming a gate stack over the active regions and regions adjacent to the active regions, depositing a layer of conductive material over the active regions and the substrate, patterning a first mask over the conductive material, etching to remove exposed portions of the conductive material and form conductive contacts, patterning a second mask over portions of the gate stacks and conductive contacts, and etching to remove exposed portions of the gate stack.
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