US Patent 9553194 Method for improved fin profile
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Patent abstract
A method can include performing an etching process to define a fin trench having a first depth, the first depth being less that a target height of fin. A method can also include forming a layer to protect sidewalls defining the fin trench. A method can also include performing a second etching process to increase a depth of fin trench.
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US Patent 09553194 Method for improved fin profile US Patent 9553194 Method for improved fin profile
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Patent Number
0955319400
Patent Number
955319400
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Edits on 6 Apr, 2023
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Patent Jurisdiction
Patent Number
095531940
Date of Patent
January 24, 2017
0Patent Application Number
148126530
Date Filed
July 29, 2015
0Official Website
Patent Primary Examiner
Edits on 28 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
095531940
Date of Patent
January 24, 2017
0Patent Application Number
148126530
Date Filed
July 29, 2015
0Official Website
Patent Primary Examiner
Edits on 15 Jun, 2022
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US Patent 09553194 Method for improved fin profile
Infobox
Is a
Patent jurisdiction
Patent number
09553194
Date of patent
January 24, 2017
Patent application number
14812653
Date Filed
July 29, 2015
Patent primary examiner
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