US Patent 9564297 Electron beam plasma source with remote radical source

Patent 9564297 was granted and assigned to Applied Materials on February, 2017 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

9564297

Date of Patent

February 7, 2017

Patent Application Number

14307945

Date Filed

June 18, 2014

Patent Citations Received

‌

US Patent 12029133 Ion beam etching with sidewall cleaning

Patent Primary Examiner

Douglas W Owens

Patent abstract

In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and a remote radical source is incorporated with the process chamber.

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