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US Patent 9570287 Flowable film curing penetration depth improvement and stress tuning

Patent 9570287 was granted and assigned to Applied Materials on February, 2017 by the United States Patent and Trademark Office.

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Patent abstract

Methods for depositing and curing a flowable dielectric layer are disclosed herein. Methods can include forming a flowable dielectric layer, immersing the flowable dielectric layer in an oxygen-containing gas, purging the chamber and curing the layer with UV radiation. By curing the layer after an oxygen-containing gas pre-soak, the layer can be more completely cured during the UV irradiation.

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