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US Patent 9625824 Extreme ultraviolet lithography collector contamination reduction
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Patent
Date Filed
July 20, 2015
Date of Patent
April 18, 2017
Patent Application Number
14803849
Patent Citations Received
US Patent 12001144 Forming multiple aerial images in a single lithography exposure pass
0
US Patent 11714350 Method of fabricating and servicing a photomask
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Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
9625824
Patent Primary Examiner
Michelle M Iacoletti
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