US Patent 9649675 In-situ capping with no loss of water depth

A method of remediating contaminated sediment area. The sediment has an initial water depth and comprises water and fine-grained solids. The contaminated sediment is contained in place by installing over the contaminated sediment an in-situ cap having a total thickness TCP. The contaminated sediment, and optionally any uncontaminated subsurface, is then consolidated until the total settlement of the contaminated and uncontaminated sediment exceeds the thickness TCP of the in-situ cap. The sediment is consolidated by installing a vertical barrier along the perimeter of the contaminated sediment area, installing a plurality of horizontal line drains into the sediment, connecting the horizontal line drains to a vacuum source, installing an in-situ cap over the contaminated sediment area and over the upper edge of the vertical barrier, and applying vacuum pressure to the horizontal line drains to dewater and consolidate the sediment.