US Patent 9653480 Nanosheet capacitor

Embodiments are directed to a method of forming a semiconductor device and resulting structures having a nanosheet capacitor by forming a first nanosheet stack over a substrate. The first nanosheet stack includes a first nanosheet vertically stacked over a second nanosheet. A second nanosheet stack is formed over the substrate adjacent to the first nanosheet stack. The second nanosheet stack includes a first nanosheet vertically stacked over a second nanosheet. Exposed portions of the first and second nanosheets of the second nanosheet stack are doped and gates are formed over channel regions of the first and second nanosheet stacks.