US Patent 9660182 Plasma processing method and plasma processing apparatus
Patent 9660182 was granted and assigned to Tokyo Electron on May, 2017 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
April 22, 2013
Date of Patent
May 23, 2017
Patent Applicant
Patent Application Number
14387655
Patent Citations Received
Patent Jurisdiction
Patent Number
Patent Primary Examiner
Find more entities like US Patent 9660182 Plasma processing method and plasma processing apparatus
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
