Patent attributes
The present disclosure is directed to ion generator device supports. An ion generator device support is configured to retain an ion generator device, the ion generator device having a first portion containing exposed electrodes and a second portion, the support includes a first wall, a second wall extending orthogonally from the first wall, a third wall extending orthogonally from the first wall opposed to the second wall, wherein the third wall extends a smaller distance from the first wall than the second wall and a fourth wall extending orthogonally from the second wall, wherein a substantially open cavity is defined by the fourth wall, the second wall and an edge of the third wall, and a substantially closed cavity is defined by the second wall, the first wall and the third wall, and wherein the first portion of the ion generator device is retained within the substantially open cavity.
