Is a
Patent attributes
Patent Applicant
Patent Jurisdiction
Patent Number
Patent Inventor Names
Alex Wayne Reed0
Wayne Frederick Reed0
Michael Felix Drenski0
Date of Patent
May 30, 2017
0Patent Application Number
144646580
Date Filed
August 20, 2014
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Simultaneous Multiple Sample Light Scattering systems and methods can be used for polymer stability testing and for applying stressors to polymer or colloid solutions including heat stress, ultrasound, freeze/thaw cycles, shear stress and exposure to different substances and surfaces, among others, that create a polymer stress response used to characterize the polymer solution and stability.
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