Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hung-Chang Hsieh0
Hung-Chung Chien0
Jhun Hua Chen0
Shu-Fang Chen0
Date of Patent
July 18, 2017
0Patent Application Number
151699220
Date Filed
June 1, 2016
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The present disclosure provides a semiconductor fabrication method. The method includes modifying an edge portion of a wafer such that the edge portion are prevented from resist coating; coating a resist layer on the front surface of the wafer, wherein the resist layer is free from the edge portion of the wafer; and performing an exposing process to the resist layer.
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