Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chung-Chiang Min0
Tsung-Hsueh Yang0
Chang-Ming Wu0
Shih-Chang Liu0
Date of Patent
July 18, 2017
Patent Application Number
14632569
Date Filed
February 26, 2015
Patent Citations Received
Patent Primary Examiner
Patent abstract
A capacitor structure includes a deep trench, a contact plug, a spacer and a metal-insulator-metal film. The deep trench extends into a crown oxide substrate, and the contact plug is disposed entirely below the crown oxide substrate. The spacer lines the deep trench, and the metal-insulator-metal film is disposed in the deep trench.
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