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US Patent 9772555 Methods of forming patterns using photoresists
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Patent
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Date Filed
February 19, 2016
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Date of Patent
September 26, 2017
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Patent Application Number
15047659
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Patent Citations Received
US Patent 11768435 Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces
Patent Inventor Names
Cheol-Hong Park
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Sang-Yoon Woo
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Sang-Min Park
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Cha-Won Koh
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Hyun-Woo Kim
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
9772555
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Patent Primary Examiner
Amanda C. Walke
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