Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 31, 2017
Patent Application Number
14531014
Date Filed
November 3, 2014
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
In a plasma processing apparatus, target values for feedback control to be applied to a progressive wave power PF as control parameters, i.e., control instruction values Con and Coff are switched during a pulse-on period Ton and a pulse-off period Toff in each cycle of a modulation pulse, respectively. That is, a first feedback control for making the progressive wave power PF approximate to a first control instruction value Con is performed during the pulse-on period Ton, whereas a second feedback control for making the progressive wave power PF approximate to a second control instruction value Coff is performed during the pulse-off period Toff.
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