Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hisashi Kawano0
Meitoku Aibara0
Motoyuki Shima0
Yuki Yoshida0
Itaru Kanno0
Kenji Mochida0
Masami Yamashita0
Date of Patent
November 14, 2017
0Patent Application Number
148093730
Date Filed
July 27, 2015
0Patent Citations Received
Patent Primary Examiner
Patent abstract
An object of the present invention is to be able to obtain a high removing performance of particles. The substrate processing method according to the exemplary embodiment comprises a film-forming treatment solution supply step and a removing solution supply step. The film-forming treatment solution supply step comprising supplying to a substrate, a film-forming treatment solution containing an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent is supplied. The removing solution supply step comprises supplying to a treatment film formed by solidification or curing of the film-forming treatment solution on the substrate, a removing solution capable of removing the treatment film.
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