US Patent 9870898 Plasma processing method and plasma processing apparatus
Patent 9870898 was granted and assigned to Tokyo Electron on January, 2018 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
February 9, 2016
Date of Patent
January 16, 2018
Patent Applicant
Patent Application Number
15018981
Patent Citations Received
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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