Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
January 23, 2018
Patent Application Number
14872775
Date Filed
October 1, 2015
Patent Citations Received
Patent Primary Examiner
Patent abstract
Processes for depositing SiO2 films on a wafer surface utilizing an aminosilane compound as a silicon precursor are described.
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