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US Patent 9911591 Selective deposition of thin film dielectrics using surface blocking chemistry

Patent 9911591 was granted and assigned to Applied Materials on March, 2018 by the United States Patent and Trademark Office.

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Patent abstract

Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface. Methods include soaking a substrate surface comprising hydroxyl-terminations with a silylamine to form silyl ether-terminations and depositing a film onto a surface other than the silyl ether-terminated surface.

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