Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jaishankar Kasthuri0
Robert Vacassy0
Shoutian Li0
Date of Patent
April 24, 2018
0Patent Application Number
127610160
Date Filed
April 15, 2010
0Patent Citations Received
...
Patent Primary Examiner
Patent abstract
The invention provides a chemical-mechanical polishing pad comprising a polymeric matrix and 0.1-15 wt. % of metal oxide particles. The polymeric matrix has pores, the metal oxide particles are uniformly distributed throughout the pores, and the metal oxide particles have a specific surface area of about 25 m2/g to about 450 m2/g. The invention further provides a method of polishing a substrate with the polishing pad.
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