Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 24, 2018
Patent Application Number
14473795
Date Filed
August 29, 2014
Patent Citations Received
Patent Primary Examiner
Patent abstract
An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
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