Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 24, 2018
Patent Application Number
15105339
Date Filed
November 14, 2014
Patent Citations Received
Patent Primary Examiner
Patent abstract
Disclosed are an inspection method and apparatus and an associated lithographic apparatus. The inspection method comprises illuminating a structure with inspection radiation of a selected wavelength, the structure being of a type comprising a plurality of layers (for example a 3D memory structure). The resultant diffraction signal is detected a physical property of a subset of said layers is determined from said diffraction signal. The subset of layers for which said physical property is determined is dependent upon the selected wavelength of the inspection radiation.
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