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US Patent D600659 Process tube for manufacturing semiconductor wafers

Patent D600659 was granted and assigned to Tokyo Electron on September, 2009 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D6006590

Patent Inventor Names

Hiroyuki Matsuura0

Koichi Shimada0

Date of Patent

September 22, 2009

Patent Application Number

292736130

Date Filed

March 9, 2007

Patent Citations Received

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US Patent D1022907 Tubular reactor

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US Patent D1019582 Inner tube of reaction tube for semiconductor manufacturing equipment

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US Patent 11952664 Substrate processing apparatus and method of manufacturing semiconductor device

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US Patent D1022905 Tubular reactor

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US Patent D1022906 Tubular reactor

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US Patent D1022904 Tubular reactor

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US Patent D986826 Reaction tube

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US Patent D1019583 Inner tube of reaction tube for semiconductor manufacturing equipment

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