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US Patent D610559 Reaction tube

Patent D610559 was granted and assigned to Hitachi on February, 2010 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D610559

Patent Inventor Names

Satoshi Okada0

Shintaro Kogura0

Tsutomu Kato0

Yuji Takebayashi0

Atsuhiko Ashitani0

Date of Patent

February 23, 2010

Patent Application Number

29327745

Date Filed

November 12, 2008

Patent Citations Received

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US Patent 11952664 Substrate processing apparatus and method of manufacturing semiconductor device

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US Patent D1019583 Inner tube of reaction tube for semiconductor manufacturing equipment

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US Patent D1019581 Inner tube of reaction tube for semiconductor manufacturing equipment

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US Patent D1019582 Inner tube of reaction tube for semiconductor manufacturing equipment

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