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US Patent D770993 Reaction tube

Patent D770993 was granted and assigned to Hitachi Kokusai Electric Inc. on November, 2016 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Patent Applicant

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Hitachi Kokusai Electric Inc.

Current Assignee

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Hitachi Kokusai Electric Inc.

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D770993

Patent Inventor Names

Tomoshi Taniyama0

Hidenari Yoshida0

Date of Patent

November 8, 2016

Patent Application Number

29555820

Date Filed

February 25, 2016

Patent Citations Received

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US Patent D1019583 Inner tube of reaction tube for semiconductor manufacturing equipment

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US Patent D1019581 Inner tube of reaction tube for semiconductor manufacturing equipment

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US Patent 11952664 Substrate processing apparatus and method of manufacturing semiconductor device

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US Patent D1019582 Inner tube of reaction tube for semiconductor manufacturing equipment

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US Patent D1022905 Tubular reactor

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US Patent D1022907 Tubular reactor

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US Patent D1022904 Tubular reactor

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US Patent D1022906 Tubular reactor

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Patent Primary Examiner

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Elizabeth J Oswecki

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