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US Patent D827592 Electrode cover for a plasma processing apparatus

Patent D827592 was granted and assigned to Hitachi on September, 2018 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

Hitachi

Current Assignee

Hitachi

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D827592

Patent Inventor Names

Takamasa Ichino0

Kazunori Nakamoto0

Kohei Sato0

Date of Patent

September 4, 2018

Patent Application Number

29610995

Date Filed

July 18, 2017

Patent Citations Received

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US Patent 12080522 Preclean chamber upper shield with showerhead

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US Patent D1006768 Semiconductor wafer for mosaic solar cell fabrication

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US Patent 11996315 Thin substrate handling via edge clamping

Patent Primary Examiner

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Elizabeth J Oswecki

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