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US Patent D937329 Sputter target for a physical vapor deposition chamber

Patent D937329 was granted and assigned to Applied Materials on November, 2021 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D9373290

Patent Inventor Names

Srinivasa Rao Yedla0

William Fruchterman0

Ilya Lavitsky0

Kirankumar Neelasandra Savandaiah0

Martin Riker0

Date of Patent

November 30, 2021

Patent Application Number

297289570

Date Filed

March 23, 2020

Patent Citations Received

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US Patent D1040304 Deposition ring for physical vapor deposition chamber

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US Patent D1001749 Base plate for a foot pedal

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US Patent D1006768 Semiconductor wafer for mosaic solar cell fabrication

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US Patent D1007449 Target profile for a physical vapor deposition chamber target

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US Patent D1012051 Electrostatic chuck for semiconductor manufacturing device

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US Patent D1021832 Elastic membrane

Patent Primary Examiner

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Calvin E Vansant

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