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US Patent D941372 Process shield for a substrate processing chamber

Patent D941372 was granted and assigned to Applied Materials on January, 2022 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D9413720

Patent Inventor Names

Goichi Yoshidome0

Ilya Lavitsky0

Keith A Miller0

Date of Patent

January 18, 2022

Patent Application Number

297288210

Date Filed

March 20, 2020

Patent Citations Received

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US Patent D1032795 Reducing plate

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US Patent D1049067 Ring for an anti-rotation process kit for a substrate processing chamber

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US Patent 12080522 Preclean chamber upper shield with showerhead

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US Patent D998575 Collimator for use in a physical vapor deposition (PVD) chamber

Patent Primary Examiner

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Calvin E Vansant

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