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US Patent D970566 Sputter target for a physical vapor deposition chamber

Patent D970566 was granted and assigned to Applied Materials on November, 2022 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D9705660

Patent Inventor Names

William Fruchterman0

Srinivasa Rao Yedla0

Martin Riker0

Kirankumar Neelasandra Savandaiah0

Ilya Lavitsky0

Date of Patent

November 22, 2022

Patent Application Number

298130650

Date Filed

October 26, 2021

Patent Citations

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US Patent 10811232 Multi-plate faceplate for a processing chamber

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US Patent 10442056 Substrate holding apparatus and polishing apparatus

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US Patent 10662520 Method for recycling substrate process components

Patent Citations Received

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US Patent D1012051 Electrostatic chuck for semiconductor manufacturing device

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US Patent D1007449 Target profile for a physical vapor deposition chamber target

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