Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kuan-Chen Wang0
Shwang-Ming Jeng0
Chih-Lung Lin0
Fang-Wen Tsai0
Keng-Chu Lin0
Date of Patent
July 5, 2011
Patent Application Number
12943479
Date Filed
November 10, 2010
Patent Citations Received
Patent Primary Examiner
Patent abstract
An extreme low-k (ELK) dielectric film scheme for advanced interconnects includes an upper ELK dielectric layer and a lower ELK dielectric with different refractive indexes. The refractive index of the upper ELK dielectric layer is greater than the refractive index of the lower ELK dielectric layer.
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