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US Patent 10002831 Selective and non-selective barrier layer wet removal
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Patent
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Date Filed
July 20, 2017
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Date of Patent
June 19, 2018
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Patent Application Number
15654869
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Patent Citations Received
US Patent 11990410 Top via interconnect having a line with a reduced bottom dimension
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US Patent 11244861 Method and structure for forming fully-aligned via
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US Patent 11315830 Metallic interconnect structures with wrap around capping layers
US Patent 11404311 Metallic interconnect structures with wrap around capping layers
US Patent 11476415 Patterning magnetic tunnel junctions and the like while reducing detrimental resputtering of underlying features
Patent Inventor Names
Hosadurga Shobha
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Benjamin D. Briggs
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Cornelius B. Peethala
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David L. Rath
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Elbert E. Huang
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Raghuveer R. Patlolla
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10002831
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Patent Primary Examiner
Hsien-Ming Lee
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