US Patent 10025179 Organometallic solution based high resolution patterning compositions
Patent 10025179 was granted and assigned to Inpria on July, 2018 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
December 29, 2015
0
Date of Patent
July 17, 2018
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Patent Applicant
Patent Application Number
14983220
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Patent Citations Received
•••
Patent Inventor Names
Douglas A. Keszler
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Kai Jiang
0
Stephen T. Meyers
0
Andrew Grenville
0
Jeremy T. Anderson
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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