Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yoshie Kimura0
Teng Hooi Goh0
Xiang Zhou0
Date of Patent
October 22, 2024
0Patent Application Number
175933710
Date Filed
March 17, 2020
0Patent Citations
...
Patent Primary Examiner
Patent abstract
Provided herein are methods and systems for reducing roughness of EUV resists and improving etched features. The methods may involve depositing a thin film on a patterned EUV resist having a stress level that is less compressive than a stress level of the patterned EUV resist. The resulting composite stress may reduce buckling and/or bulging of the patterned EUV resist.
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