Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wesley P. Graff0
Date of Patent
March 4, 2014
0Patent Application Number
133723630
Date Filed
February 13, 2012
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method of etching or removing an organic hardmask overlying a low dielectric constant film in a lithographic process. The method includes providing a dielectric film having thereover an organic hardmask to be removed, the dielectric film having a dielectric constant no greater than about 4.0, introducing over the organic hardmask an ionizable gas comprising a mixture of hydrogen and an oxidizing gas, and applying energy to the mixture to create a plasma of the mixture. The method further includes contacting the organic hardmask with the plasma, with the organic hardmask being at a temperature in excess of 200° C., to remove the organic hardmask without substantially harming the underlying substrate.
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