US Patent 8318575 Compressive polycrystalline silicon film and method of manufacture thereof

Patent 8318575 was granted and assigned to Infineon Technologies on November, 2012 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Infineon Technologies

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

8318575

Patent Inventor Names

Markus Meyer0

Stefan Pompl0

Wolfgang Lehnert0

Date of Patent

November 27, 2012

Patent Application Number

13022411

Date Filed

February 7, 2011

Patent Citations Received

‌

US Patent 12125711 Reducing roughness of extreme ultraviolet lithography resists

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US Patent 11746420 PECVD apparatus for in-situ deposition of film stacks

Patent Primary Examiner

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Kevin Parendo

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