Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Amit Chatterjee0
Abhijit Basu Mallick0
Nitin K. Ingle0
Paul Deaton0
Timothy Michaelson0
Timothy W. Weidman0
Date of Patent
June 18, 2013
Patent Application Number
13267341
Date Filed
October 6, 2011
Patent Citations Received
Patent Primary Examiner
Patent abstract
Methods for forming photoresists sensitive to radiation on a substrate are provided. Described are chemical vapor deposition methods of forming films (e.g., silicon-containing films) as photoresists using a plasma which may be exposed to radiation to form a pattern. The deposition methods utilize precursors with cross-linkable moieties that will cross-link upon exposure to radiation. Radiation may be carried out in the with or without the presence of oxygen. Exposed or unexposed areas may then be developed in an aqueous base developer.
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