Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 21, 2018
Patent Application Number
15483210
Date Filed
April 10, 2017
Patent Citations Received
Patent Primary Examiner
Patent abstract
A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning.
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