Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Keith William Gaff0
Vahid Vahedi0
Harmeet Singh0
Keith Comendant0
Date of Patent
August 21, 2018
Patent Application Number
14139238
Date Filed
December 23, 2013
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
A plasma etching system having a substrate support assembly with multiple independently controllable heater zones. The plasma etching system is configured to control etching temperature of predetermined locations so that pre-etch and/or post-etch non-uniformity of critical device parameters can be compensated for.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
