Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
August 28, 2018
Patent Application Number
14944904
Date Filed
November 18, 2015
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
Detecting presence or absence of plasma is accomplished from probe signals. In one embodiment, a low-power modulated signal is applied to an electrostatic chuck from a bias power generator. A corresponding system then monitors peak-to-peak voltage (Vpp) signal responses or radio frequency current responses. The probe signal can be generated to have insufficient power to either ignite or sustain plasma discharge (or cause component damage). Thus, low-duty and/or low current pulsing signals to be used. Presence or absence of the bulk plasma will then result in different Vpp or radio frequency current values.
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