Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hung-Chung Chien0
Shu-Fang Chen0
Hung-Chang Hsieh0
Lin-Hung Shiu0
Date of Patent
October 16, 2018
0Patent Application Number
153553590
Date Filed
November 18, 2016
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A lithography method is provided in accordance with some embodiments. The lithography method includes forming a surface modification layer on a substrate, the surface modification layer including a hydrophilic top surface; coating a photoresist layer on the surface modification layer; and developing the photoresist layer, thereby forming a patterned photoresist layer.
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