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US Patent 10109461 Plasma processing method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
July 6, 2017
Date of Patent
October 23, 2018
Patent Application Number
15642469
Patent Citations Received
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US Patent 11495470 Method of enhancing etching selectivity using a pulsed plasma
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US Patent 11508554 High voltage filter assembly
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US Patent 12125673 Pulsed voltage source for plasma processing applications
0
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US Patent 11462389 Pulsed-voltage hardware assembly for use in a plasma processing system
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US Patent 11476090 Voltage pulse time-domain multiplexing
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US Patent 11476145 Automatic ESC bias compensation when using pulsed DC bias
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
0
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US Patent 12111341 In-situ electric field detection method and apparatus
0
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US Patent 11462388 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 10593519 Plasma processing apparatus
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10109461
Patent Primary Examiner
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Parviz Hassanzadeh

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