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US Patent 10121671 Methods of depositing metal films using metal oxyhalide precursors

Patent 10121671 was granted and assigned to Applied Materials on November, 2018 by the United States Patent and Trademark Office.

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Patent abstract

Processing methods comprising exposing a substrate to an optional nucleation promoter followed by sequential exposure of a first reactive gas comprising a metal oxyhalide compound and a second reactive gas to form a metal film on the substrate.

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