Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chloe Baldasseroni0
Shankar Swaminathan0
Date of Patent
November 20, 2018
0Patent Application Number
153512210
Date Filed
November 14, 2016
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Methods and apparatuses for forming high modulus silicon oxide spacers using atomic layer deposition are provided. Methods involve depositing at high temperature, using high plasma energy, and post-treating deposited silicon oxide using ultraviolet radiation. Such silicon oxide spacers are suitable for use as masks in multiple patterning applications to prevent pitch walking.
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